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Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide — mirror polishing and surface properties
Chemical mechanical polishing Titanium XPS
2009/9/11
Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H2O2 up to 3 wt%, to obtain flat and mirror-polished surfaces...